ENGLISH
|
JAPANESE
|
CONNECT WITH US:
Home
About
Contact
Log in
*
Home
Press release
May 19, 2015 18:45 JST
Source:
Applied Materials, Inc.
Applied Materials' Breakthrough Patterning Hardmask Enables Copper Interconnect Scaling
- New hardmask technology is essential for patterning closely spaced, thin interconnects to 10nm and beyond
- Underscores PVD leadership with system now tool of record for multiple device generations at leading chipmakers
SANTA CLARA, CA, May 19, 2015 - (ACN Newswire) - Applied Materials, Inc. today announced its Applied Endura(R) Cirrus(TM) HTX PVD* system with breakthrough technology for patterning copper interconnects at 10nm and beyond. As chip features continue to shrink, innovations in hardmask are required to preserve the pattern integrity of tightly packed, tiny interconnect structures. With the introduction of this technology, Applied enables scaling of the TiN* metal hardmask - the industry's material of choice - to meet the patterning needs of copper interconnects in advanced microchips.
"Precision engineering of metal hardmask films is key to addressing the patterning challenges for advanced interconnects," said Dr. Sundar Ramamurthy, vice president and general manager of Applied's Metal Deposition Products business unit. "The Cirrus HTX TiN product represents Applied's decades of expertise in applying PVD technology for engineering TiN film properties. Incorporating our unique VHF*-based technology offers customers the flexibility of tuning stress in TiN films from compressive to tensile to overcome their specific integration challenges."
Today's advanced microchips can pack 20 kilometers of copper wiring in a 100 square millimeter area, stacked in 10 layers with up to 10 billion vias or vertical connections between layers. The role of the metal hardmask is to preserve the integrity of these patterned lines and vias in soft ULK* dielectrics. However, with scaling, the compressive stress from conventional TiN hardmask layers can cause the narrow lines patterned in ULK films to deform or collapse. The tunable Cirrus HTX TiN hardmask with high etch selectivity delivers superior CD* line width control and via overlay alignment resulting in yield improvement.
This breakthrough in TiN hardmask is made possible by precision materials engineering at the wafer level to produce a high density, low-stress film. Combining exceptional film thickness uniformity with low defectivity on a proven Endura platform, the Cirrus HTX system addresses the stringent high volume manufacturing needs of patterning multiple interconnect layers.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in precision materials engineering solutions for the semiconductor, flat panel display and solar photovoltaic industries. Our technologies help make innovations like smartphones, flat screen TVs and solar panels more affordable and accessible to consumers and businesses around the world. Learn more at www.appliedmaterials.com.
* PVD=physical vapor deposition; TiN=titanium nitride; VHF=very high frequency; ULK=ultra-low k; CD=critical dimension
Contact:
Connie Duncan (editorial/media) +1-408-563-6209,
connie_duncan@amat.com
Michael Sullivan (financial community) +1-408-986-7977,
michael_sullivan@amat.com
PHOTO: Applied Endura(R) Cirrus HTX PVD System:
http://hugin.info/143724/R/1922305/689113.jpg
###
This announcement is distributed by NASDAQ OMX Corporate Solutions on behalf of NASDAQ OMX Corporate Solutions clients.
The issuer of this announcement warrants that they are solely responsible for the content, accuracy and originality of the information contained therein.
Source: Applied Materials via Globenewswire
Source: Applied Materials, Inc.
Copyright ©2024 ACN Newswire. All rights reserved. A division of Asia Corporate News Network.
Latest Release
DENSO and Certhon Introduce Artemy, A Fully Automated Cherry Truss Tomato Harvesting Robot
May 14, 2024 11:02 JST
Supercomputer Fugaku retains first place worldwide in HPCG and Graph500 rankings
May 13, 2024 18:32 JST
Eisai's Antiepileptic Drug Fycompa Approved in China for Adjunctive Treatment of Primary Generalized Tonic-Clonic Seizures
May 13, 2024 17:06 JST
Ogier and TOYOTA GAZOO Racing triumph again
May 13, 2024 14:36 JST
Spa points haul for TOYOTA GAZOO Racing
May 13, 2024 13:56 JST
DOCOMO to Launch NTT DOCOMO GLOBAL for Global Expansion
May 10, 2024 18:13 JST
Release of "Fugaku-LLM" - a large language model trained on the supercomputer "Fugaku"
May 10, 2024 12:20 JST
Paltalk, Inc. Reports Slight Increase in Revenue and 33% Reduction in Net Loss for First Quarter 2024
May 09, 2024 20:39 JST
Cordlife Accelerates Lab and Technical Staff Recruitment to Rebuild Foundation and Strengthen Core Processes in Singapore
May 09, 2024 19:00 JST
Honda Opens New R&D Facility in Bengaluru to Accelerate Electrification in India
May 09, 2024 14:13 JST
Fujitsu introduces "explainable AI" for use in genomic medicine and cancer treatment planning
May 09, 2024 10:41 JST
Mitsubishi Heavy Industries Increases Dividends on Back of Historically High FY2023 Results, Releases FY2024 Guidance
May 08, 2024 14:27 JST
Rome becomes the first European city to offer open loop transit payments to JCB Cardmembers
May 08, 2024 12:00 JST
NEC X Invests in Public Safety Startup Multitude Insights, Scaling AI-Powered Collaboration and Information Sharing for Law Enforcement
May 08, 2024 10:24 JST
ServiceNow and Fujitsu announce strategic commitment to launch innovative cross-industry solutions
May 08, 2024 08:52 JST
Fujitsu launches mainframe modernization automation service for the Japanese market
May 07, 2024 17:53 JST
MHI Agrees to Collaborate with Chiyoda Corporation for Licensing of CO2 Capture Technologies
May 07, 2024 13:49 JST
Four-strong TOYOTA GAZOO Racing squad to push for more Portugal success
May 02, 2024 18:05 JST
Spectacular Spa awaits TOYOTA GAZOO Racing
May 02, 2024 17:46 JST
Q&M Dental Enhances Digital Capabilities by Integrating Align Technology's Newest iTero Lumina(TM) Intraoral Scanner Across Dental Clinics in Singapore
May 02, 2024 11:00 JST
More Latest Release >>
Related Release
Electronics Asia Conference 2023 to Highlight IoT, AI/ML, Automotive, and Wireless Developments Driving Semiconductor Industry Growth in Asia
October 05 2023 10:22 JST
Thailand's Semiconductor Sector On Track to Tap US$280B Global Automotive Electronics Industry
March 10 2016 13:00 JST
Applied Materials Announces First Quarter 2016 Results
February 19 2016 10:00 JST
Applied Materials Appoints Adrianna Ma to Board of Directors
December 18 2015 22:30 JST
Applied Materials' Chorng-Ping Chang Named 2016 IEEE Fellow
December 15 2015 20:30 JST
Applied Materials Announces Cash Dividend
December 08 2015 08:40 JST
EVENT ADVISORY: Semiconductor Industry Experts to Examine the Changing Face of Non-Volatile Memory
December 01 2015 22:00 JST
Applied Materials Announces Fourth Quarter and Fiscal Year 2015 Results
November 13 2015 06:40 JST
Applied Materials to Present at Upcoming Investor Conferences
November 09 2015 23:25 JST
Applied Materials Appoints Eric Chen to Board of Directors
November 06 2015 07:05 JST
More Press release >>